The other parameters are shown in Table 1. The bandgaps in the table
do not affect optical absorption but carrier transport phenomenon. To take into account the phosphorus diffusion into the Si-QDSL layer, a calculation with the donor concentration in Si-QDs of 1 × 1017 cm-3 was also performed. The light I-V characteristics were calculated, assuming solar illumination of AM1.5G at 100 mW/cm2. Additionally, the quantum efficiencies were calculated without bias light and bias voltage. An incident light was put into the solar cells from the quartz substrate side normally. DAPT The light intensity and the photogeneration rate were calculated based on the ray tracing method, where the Si-QDSL was regarded as an optically homogeneous material, and the optical parameters from the spectroscopic ellipsometry measurement of the Si-QDSL were used. Table 1 Parameters of each layer for calculations Parameters n-type poly-Si Si-QD a-Si1 – x – y C x O y p-type a-Si Energy gap
(eV) 1.13 1.13 2.5 1.7 Electron affinity (eV) 4.17 4.17 3.5 4.0 Carrier lifetime (s) 1 × 10-15 1 × 10-10 1 × 10-10 1 × 10-6 Electron mobility (cm2/Vs) 1 1 1 1 Hole mobility (cm2/Vs) 0.1 0.1 0.1 0.1 Donor concentration (cm-3) 1 × 1019 0 or 1 × 1017 – - Accepter concentration (cm-3) – - – 1 × 1019 Results PRIMA-1MET and discussion Optical properties of Si-QDSLs The concentrations of Si, C, and O in a-Si1 – x – y C x Thalidomide O y thin films were measured by the relative sensitivity factor (RSF) method. The concentrations of Si, C, and O for each CO2/MMS flow rate ratio were shown in Table 2. The oxygen concentration and the find more deposition rate of the films depend on the CO2/MMS flow rate
ratio. The oxygen concentrations of the films prepared without CO2 gas and with the CO2/MMS flow rate ratios of 0.3, 1.5, and 3.0 were 17.5, 25.1, 32.6, and 39.8 at.%, respectively. Oxygen was observed even in the as-deposited film prepared without flowing CO2 gas. This unintentionally incorporated oxygen is thought to be originating from the deposition atmosphere. The deposition rate is proportional to the oxygen concentration in the film, suggesting that the volume of the thin film increases with the oxygen incorporation. Table 2 Concentrations of Si, C, and O in a-Si 1 – x – y C x O y films with several CO 2 /MMS flow rate ratios CO2/MMS Si (at.%) C (at.%) O (at.%) 0 44.6 37.9 17.5 0.3 40.3 34.6 25.1 1.5 34.2 33.2 32.6 3.0 31.9 28.3 39.8 The crystallization of Si-QDs was investigated by Raman scattering spectroscopy. The Raman spectra of the Si-QDSLs with the CO2/MMS flow rate ratios of 0, 0.3, 1.5, and 3.0 are shown in Figure 3. A Raman spectrum was separated into three Gaussian curves. The peaks at approximately 430 and 490 cm-1 are originating from the LO mode and TO mode of a-Si phase, respectively [30].